Exposure Parameters in Proton Beam Writing for KMPR and EpoCore Negative Tone Photoresist

Apr 1, 2022

by M. D. and Shao P.G. Ynsa and S.R. and Nannan Liu Kulkarni
Reference:
M. D. and Shao P.G. Ynsa and S.R. and Nannan Liu Kulkarni, “Exposure Parameters in Proton Beam Writing for KMPR and EpoCore Negative Tone Photoresist”, 2010.
Bibtex Entry:
@misc{ynsa_m_d_exposure_2010,
	type = {Poster contribution},
	title = {Exposure {Parameters} in {Proton} {Beam} {Writing} for {KMPR} and {EpoCore} {Negative} {Tone} {Photoresist}},
	shorttitle = {({ICNMTA2010})},
	author = {{Ynsa, M. D.} and {Shao, P.G.} and {Kulkarni, S.R.} and {Nannan, Liu} and {Van Kan, J.A.}},
	year = {2010},
}