Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering

by A. and Gago R. Redondo-Cubero, L. and Sánchez-García J.A. Vázquez and J. and Castro M. Muñoz-García

Reference:

A. and Gago R. Redondo-Cubero, L. and Sánchez-García J.A. Vázquez and J. and Castro M. Muñoz-García, “Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering”, Sestri Levante, Italy, 2007.

Bibtex Entry:

@misc{redondo-cubero_a_surface_2007,
	address = {Sestri Levante, Italy},
	type = {Poster contribution},
	title = {Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering},
	author = {{Redondo-Cubero, A.} and {Gago, R.} and {Vázquez, L.} and {Sánchez-García, J.A.} and {Muñoz-García, J.} and {Castro, M.} and {Cuerno, R.}},
	month = sep,
	year = {2007},
}