by P. L. Pernas, E. Ruiz, J. Garrido, J. Piqueras, F. Paszti, A. Climent-Font, G. Lifante and E. Cantelar
Abstract:
Cross-Disciplinary Applied Research in Materials Science and Technology: Silicon Oxynitride ECR-PECVD Films for Integrated Optics
Reference:
P. L. Pernas, E. Ruiz, J. Garrido, J. Piqueras, F. Paszti, A. Climent-Font, G. Lifante and E. Cantelar, “Silicon Oxynitride ECR-PECVD Films for Integrated Optics”, Materials Science Forum, vol. 480-481, pp. 149–154.
Bibtex Entry:
@article{pernas_silicon_2005,
title = {Silicon {Oxynitride} {ECR}-{PECVD} {Films} for {Integrated} {Optics}},
volume = {480-481},
issn = {1662-9752},
url = {https://www.scientific.net/MSF.480-481.149},
doi = {10.4028/www.scientific.net/MSF.480-481.149},
abstract = {Cross-Disciplinary Applied Research in Materials Science and Technology: Silicon Oxynitride ECR-PECVD Films for Integrated Optics},
language = {EN},
urldate = {2017-10-06},
journal = {Materials Science Forum},
author = {Pernas, P. L. and Ruiz, E. and Garrido, J. and Piqueras, J. and Paszti, F. and Climent-Font, A. and Lifante, G. and Cantelar, E.},
year = {2005},
pages = {149--154},
file = {Snapshot:E:\cmam_papers\files\1057\MSF.480-481.html:text/html;Snapshot:E:\Usuarios\Administrator\Zotero\storage\E2XSQECE\MSF.480-481.html:text/html},
}