by P. L. Pernas, J. Piqueras, G. A. Torchia, A. Climent-Font and F. Jaque
Abstract:
In this work we present results of Si/SiO2/SiON/SiO2 waveguides fabricated by means of ECR-PECVD. In order to change refraction index and simultaneously to reduce losses related with hydrogen, we have used N2 as precursor gas for controlling the nitrogen to oxygen relation. The composition of the samples were carefully controlled by RBS and ERDA analysis. In this paper we also present results of channel waveguides fabricated on silicon oxynitride material by using infrared femtosecond laser pulses. This approach is based on Si/SiO2/SiON/SiO2 planar waveguides previously fabricated and show low propagation losses.
Reference:
P. L. Pernas, J. Piqueras, G. A. Torchia, A. Climent-Font and F. Jaque, “Silicon-based waveguide materials for integrated optics”, In Proceedings of 2005 IEEE/LEOS Workshop on Fibres and Optical Passive Components, 2005., pp. 399–402.
Bibtex Entry:
@inproceedings{pernas_silicon-based_2005, title = {Silicon-based waveguide materials for integrated optics}, doi = {10.1109/WFOPC.2005.1462162}, abstract = {In this work we present results of Si/SiO2/SiON/SiO2 waveguides fabricated by means of ECR-PECVD. In order to change refraction index and simultaneously to reduce losses related with hydrogen, we have used N2 as precursor gas for controlling the nitrogen to oxygen relation. The composition of the samples were carefully controlled by RBS and ERDA analysis. In this paper we also present results of channel waveguides fabricated on silicon oxynitride material by using infrared femtosecond laser pulses. This approach is based on Si/SiO2/SiON/SiO2 planar waveguides previously fabricated and show low propagation losses.}, booktitle = {Proceedings of 2005 {IEEE}/{LEOS} {Workshop} on {Fibres} and {Optical} {Passive} {Components}, 2005.}, author = {Pernas, P. L. and Piqueras, J. and Torchia, G. A. and Climent-Font, A. and Jaque, F.}, month = jun, year = {2005}, keywords = {RBS, Rutherford backscattering, refractive index, silicon, Hydrogen, RBS analysis, Optical waveguides, optical fabrication, Optical refraction, optical waveguides, Waveguides, integrated optics, ECR-PECVD, channel waveguides, Direct writing, ERDA analysis, Gas lasers, high-speed optical techniques, infrared femtosecond laser pulses, Integrated optics, laser materials processing, Nitrogen, optical losses, Optical losses, optical materials, Optical materials, plasma CVD, plasma radiofrequency heating, propagation losses, refraction index, Si-SiO2-SiON-SiO2, Si/SiO2/SiON/SiO2 waveguides, Silicon, silicon compounds, Silicon oxnitride, silicon oxynitride material, silicon-based waveguide materials, Ultrafast optics}, pages = {399--402}, file = {IEEE Xplore Abstract Record:E:\cmam_papers\files\1055\1462162.html:text/html;IEEE Xplore Abstract Record:E:\Usuarios\Administrator\Zotero\storage\DIAAYXHI\1462162.html:text/html;IEEE Xplore Full Text PDF:E:\cmam_papers\files\1054\Pernas et al. - 2005 - Silicon-based waveguide materials for integrated o.pdf:application/pdf;IEEE Xplore Full Text PDF:E:\Usuarios\Administrator\Zotero\storage\38F2ALRP\Pernas et al. - 2005 - Silicon-based waveguide materials for integrated o.pdf:application/pdf;SCOPUS Snapshot:E:\cmam_papers\files\473\display.html:text/html;SCOPUS Snapshot:E:\Usuarios\Administrator\Zotero\storage\FCV49V64\display.html:text/html}, }