by R. Gago, J. Neidhardt, M. Vinnichenko, U. Kreissig, Zs. Czigány, A. Kolitsch, L. Hultman and W. Möller
Abstract:
Carbon nitride (CNx) thin films were grown at different substrate temperatures by low-energy (textless100 eV) ion beam assistance deposition (LE-IBAD) in order to discern possible formation mechanisms of a fullerene-like (FL) microstructure. The samples are compared to those of well-structured FL-CNx films synthesized by reactive magnetron sputtering (MS). The comparison yields similar trends for both techniques, such as limitation of the nitrogen content at 20–25 at.%, dominance of sp2 hybrids, as well as thermally activated chemical desorption of CxNy species from the substrate during growth. However, CNx films produced by LE-IBAD are amorphous. The lack of FL structural features correlates with a lower degree of sp2 clustering, attributed to the promotion of nitrile groups. Therefore, low-energy ion bombardment is shown not to be a sufficient condition for the growth of FL-CNx. This result reinforces the eventual relevance of pre-formed CxNy species at the sputtering target in MS for the introduction and/or evolution of FL arrangements.
Reference:
R. Gago, J. Neidhardt, M. Vinnichenko, U. Kreissig, Zs. Czigány, A. Kolitsch, L. Hultman and W. Möller, “Synthesis of carbon nitride thin films by low-energy ion beam assisted evaporation: on the mechanisms for fullerene-like microstructure formation”, Thin Solid Films, vol. 483, no. 1, pp. 89–94.
Bibtex Entry:
@article{gago_synthesis_2005,
title = {Synthesis of carbon nitride thin films by low-energy ion beam assisted evaporation: on the mechanisms for fullerene-like microstructure formation},
volume = {483},
issn = {0040-6090},
shorttitle = {Synthesis of carbon nitride thin films by low-energy ion beam assisted evaporation},
url = {http://www.sciencedirect.com/science/article/pii/S0040609004018437},
doi = {10.1016/j.tsf.2004.12.027},
abstract = {Carbon nitride (CNx) thin films were grown at different substrate temperatures by low-energy ({textless}100 eV) ion beam assistance deposition (LE-IBAD) in order to discern possible formation mechanisms of a fullerene-like (FL) microstructure. The samples are compared to those of well-structured FL-CNx films synthesized by reactive magnetron sputtering (MS). The comparison yields similar trends for both techniques, such as limitation of the nitrogen content at 20–25 at.%, dominance of sp2 hybrids, as well as thermally activated chemical desorption of CxNy species from the substrate during growth. However, CNx films produced by LE-IBAD are amorphous. The lack of FL structural features correlates with a lower degree of sp2 clustering, attributed to the promotion of nitrile groups. Therefore, low-energy ion bombardment is shown not to be a sufficient condition for the growth of FL-CNx. This result reinforces the eventual relevance of pre-formed CxNy species at the sputtering target in MS for the introduction and/or evolution of FL arrangements.},
number = {1},
urldate = {2017-07-21},
journal = {Thin Solid Films},
author = {Gago, R. and Neidhardt, J. and Vinnichenko, M. and Kreissig, U. and Czigány, Zs. and Kolitsch, A. and Hultman, L. and Möller, W.},
month = jul,
year = {2005},
keywords = {Carbon nitride, Fullerene-like materials, Growth mechanisms, IBAD},
pages = {89--94},
file = {ScienceDirect Snapshot:E:\cmam_papers\files\452\S0040609004018437.html:text/html;ScienceDirect Snapshot:E:\Usuarios\Administrator\Zotero\storage\G96ZNPFK\S0040609004018437.html:text/html},
}