Exposure Parameters in Proton Beam Writing for KMPR and EpoCore Negative Tone Photoresist

by M. Ynsa D., Shao P.G., Kulkarni S.R., Nannan Liu and Van Kan J.A.

Reference:

M. Ynsa D., Shao P.G., Kulkarni S.R., Nannan Liu and Van Kan J.A., “Exposure Parameters in Proton Beam Writing for KMPR and EpoCore Negative Tone Photoresist”, Poster contribution, 12th International Conference on Nuclear Microprobe Technology and Applications.

Bibtex Entry:

@misc{d_exposure_2010,
	address = {12th International Conference on Nuclear Microprobe Technology and Applications},
	type = {Poster contribution},
	title = {Exposure {Parameters} in {Proton} {Beam} {Writing} for {KMPR} and {EpoCore} {Negative} {Tone} {Photoresist}},
	shorttitle = {({ICNMTA2010})},
	author = {D., M., Ynsa and P.G., , Shao and S.R., , Kulkarni and Liu, , Nannan and J.A., , Van Kan},
	year = {2010},
}