by M. Barawi, C. Granero, P. Díaz-Chao, C. V. Manzano, M. Martin-Gonzalez, D. Jimenez-Rey, I. J. Ferrer, J. R. Ares, J. F. Fernández and C. Sánchez
Abstract:
Nanocrystalline Mg films with thicknesses between 45 and 900 nm were prepared by e-beam on fused-SiO2 substrates and hydrogenated at 280 °C to investigate the H-absorption/desorption process. Films were characterized by XRD, RBS, Raman, FEG, “in situ” optical measurements and TPD-MS. Whereas practically full conversion into MgH2 is observed in thinner films (d textless 150–200 nm), higher amount of hydrogen is not absorbed by thicker films (d textgreater 200–250 nm) that is attributed to the formation of Mg2Si–MgO phases (observed by RBS and Raman) as well as the slow kinetics of MgH2 formation. H-desorption process is controlled by a nucleation and growth process and hydrogen is released at lower desorption temperatures (Td = 425 °C) than bulk MgH2. Td are slightly lower (ΔT ∼ 25 °C) in thickest hydrogenated films (d textgreater 200–250 nm) suggesting an influence of Mg2Si and MgO phases, formed during hydrogenation.
Reference:
M. Barawi, C. Granero, P. Díaz-Chao, C. V. Manzano, M. Martin-Gonzalez, D. Jimenez-Rey, I. J. Ferrer, J. R. Ares, J. F. Fernández and C. Sánchez, “Thermal decomposition of non-catalysed MgH2 films”, International Journal of Hydrogen Energy, vol. 39, no. 18, pp. 9865–9870.
Bibtex Entry:
@article{barawi_thermal_2014,
title = {Thermal decomposition of non-catalysed {MgH2} films},
volume = {39},
issn = {0360-3199},
url = {http://www.sciencedirect.com/science/article/pii/S0360319914000809},
doi = {10.1016/j.ijhydene.2014.01.030},
abstract = {Nanocrystalline Mg films with thicknesses between 45 and 900 nm were prepared by e-beam on fused-SiO2 substrates and hydrogenated at 280 °C to investigate the H-absorption/desorption process. Films were characterized by XRD, RBS, Raman, FEG, “in situ” optical measurements and TPD-MS. Whereas practically full conversion into MgH2 is observed in thinner films (d {textless} 150–200 nm), higher amount of hydrogen is not absorbed by thicker films (d {textgreater} 200–250 nm) that is attributed to the formation of Mg2Si–MgO phases (observed by RBS and Raman) as well as the slow kinetics of MgH2 formation. H-desorption process is controlled by a nucleation and growth process and hydrogen is released at lower desorption temperatures (Td = 425 °C) than bulk MgH2. Td are slightly lower (ΔT ∼ 25 °C) in thickest hydrogenated films (d {textgreater} 200–250 nm) suggesting an influence of Mg2Si and MgO phases, formed during hydrogenation.},
number = {18},
urldate = {2017-10-23},
journal = {International Journal of Hydrogen Energy},
author = {Barawi, M. and Granero, C. and Díaz-Chao, P. and Manzano, C. V. and Martin-Gonzalez, M. and Jimenez-Rey, D. and Ferrer, I. J. and Ares, J. R. and Fernández, J. F. and Sánchez, C.},
month = jun,
year = {2014},
keywords = {Hydrogen storage, Magnesium disilicide, Magnesium hydride, Nanocrystalline film, Raman-spectroscopy, Thermal decomposition mechanism},
pages = {9865--9870},
file = {ScienceDirect Full Text PDF:E:\cmam_papers\files\1249\Barawi et al. - 2014 - Thermal decomposition of non-catalysed MgH2 films.pdf:application/pdf;ScienceDirect Full Text PDF:E:\Usuarios\Administrator\Zotero\storage\YUH8PVYB\Barawi et al. - 2014 - Thermal decomposition of non-catalysed MgH2 films.pdf:application/pdf;ScienceDirect Snapshot:E:\cmam_papers\files\1248\S0360319914000809.html:text/html;ScienceDirect Snapshot:E:\Usuarios\Administrator\Zotero\storage\WXF92FFR\S0360319914000809.html:text/html},
}