Influence of sputtering rate on nanopatterning of crystalline silicon surfaces by low-energy ion beam erosion

by Sánchez-García J.A., Vázquez L., Gago R., Plantevin O., Metzger T.H., Muñoz-García J., Castro M. and Cuerno R.

Reference:

Sánchez-García J.A., Vázquez L., Gago R., Plantevin O., Metzger T.H., Muñoz-García J., Castro M. and Cuerno R., “Influence of sputtering rate on nanopatterning of crystalline silicon surfaces by low-energy ion beam erosion”, Poster contribution, Nanopatterning via Ions, Photon beam and Epitaxy, Sestri Levante, Italy.

Bibtex Entry:

@misc{ja_influence_2007,
	address = {Nanopatterning via Ions, Photon beam and Epitaxy, Sestri Levante, Italy},
	type = {Poster contribution},
	title = {Influence of sputtering rate on nanopatterning of crystalline silicon surfaces by low-energy ion beam erosion},
	author = {J.A., , Sánchez-García and L., , Vázquez and R., , Gago and O., , Plantevin and T.H., , Metzger and J., , Muñoz-García and M., , Castro and R., , Cuerno},
	month = sep,
	year = {2007},
}