by D. Carbone, O. Plantevin, R. Gago, C. Mocuta, O. Bikondoa, A. Alija, L. Petit, H. Djazuli and T.-H. Metzger
Abstract:
A compact portable vacuum-compatible chamber designed for surface X-ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc., using a variety of X-ray-based techniques such as reflectivity, grazing-incidence small-angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra-high-vacuum conditions. Coherent X-ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.
Reference:
D. Carbone, O. Plantevin, R. Gago, C. Mocuta, O. Bikondoa, A. Alija, L. Petit, H. Djazuli and T.-H. Metzger, “Versatile vacuum chamber for in situ surface X-ray scattering studies”, Journal of Synchrotron Radiation, vol. 15, no. 4, pp. 414–419.
Bibtex Entry:
@article{carbone_versatile_2008,
title = {Versatile vacuum chamber for in situ surface {X}-ray scattering studies},
volume = {15},
copyright = {Copyright (c) 2008 International Union of Crystallography},
issn = {0909-0495},
url = {http://scripts.iucr.org/cgi-bin/paper?kv5046},
doi = {10.1107/S0909049508003944},
abstract = {A compact portable vacuum-compatible chamber designed for surface X-ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc., using a variety of X-ray-based techniques such as reflectivity, grazing-incidence small-angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra-high-vacuum conditions. Coherent X-ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.},
language = {en},
number = {4},
journal = {Journal of Synchrotron Radiation},
author = {Carbone, D. and Plantevin, O. and Gago, R. and Mocuta, C. and Bikondoa, O. and Alija, A. and Petit, L. and Djazuli, H. and Metzger, T.-H.},
month = jul,
year = {2008},
pages = {414--419},
file = {Snapshot:E:\cmam_papers\files\855\paper.html:text/html;Snapshot:E:\Usuarios\Administrator\Zotero\storage\4EMBAA7D\paper.html:text/html},
}