Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering

by Redondo-Cubero A., Gago R., Vázquez L., Sánchez-García J.A., Muñoz-García J., Castro M. and Cuerno R.

Reference:

Redondo-Cubero A., Gago R., Vázquez L., Sánchez-García J.A., Muñoz-García J., Castro M. and Cuerno R., “Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering”, Poster contribution, Nanopatterning via Ions, Photon beam and Epitaxy, Sestri Levante, Italy.

Bibtex Entry:

@misc{a_surface_2007,
	address = {Nanopatterning via Ions, Photon beam and Epitaxy, Sestri Levante, Italy},
	type = {Poster contribution},
	title = {Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering},
	author = {A., , Redondo-Cubero and R., , Gago and L., , Vázquez and J.A., , Sánchez-García and J., , Muñoz-García and M., , Castro and R., , Cuerno},
	month = sep,
	year = {2007},
}