Event 

Title:
Seminar at the Accelerator - Silicon surface nanostructuring by ion erosion: the influence of simult
When:
10.02.2011 - 10.02.2011
Where:
CMAM - Madrid
Category:
Informal seminars at the Accelerator

Description

Speaker:  José Ángel Sánchez García, Instituto de Ciencias de Materiales (ICMM - CSIC), Madrid, Spain

In the last decade, the production of self-organized nanopatterning on different surfaces by ion bombardment at low energy (<1keV), / IBS /, has proved to be a promising tool to nanostructuring using a "bottom-up. This technique allows a control over the main features of the patterns from his production over large areas (cm2) and relatively short processing times (few minutes). In this talk, we will present the production of self-organized nanopatterning of silicon surfaces by / IBS / under the simultaneous incorporation of metals. It will show how the inclusion of metals during irradiation of silicon can add an additional parameter to define the morphology. In particular, the increase of level metal incorporation may result to new morphologies, similar to the nanodots in the order and characteristics between the nanostructures. Finally, this work proves the relevance and importance of the chemical analysis of the surface after this type of nanostructuring processes.

Venue

CMAM
Venue:
CMAM   -   Website
Street:
Faraday 3, Campus de Cantoblanco
ZIP:
28049
City:
Madrid
Country:
Country: es

Description

The seminar takes place at the meeting room of the CMAM